Extreme process environment requirements of semiconductor cutting-edge technology
The typical application scenario of the company’s core product for cleanroom are FFU and air filters. With the reduction of the key line width of semiconductor chips, the continuous improvement and iteration of process technology, and constantly put forward the most demanding requirements of air filtration technology.
Semiconductor Line Width
Nano process requires cleanliness ISO Class 1
Circuit corrosion caused by “acid” gas
T-topping problem caused by “alkaline” gas
The large-scale application of MayAir FFU witnesses the growth of China’s semiconductor industry
Technical features: low noise, high efficiency, low energy consumption, group control system, long service life.
FFU
EFU
Control technology of gaseous molecular pollutants helps improve semiconductor yield
With the reduction of key line width dimensions of semiconductor chips and continuous improvement and iteration of process technology, the control technology of gaseous molecular pollutants AMC (Airborne Molecular Contamination) has become a necessary means for improving semiconductor yield. Since 2005, MayAir’s Gaseous Filtration Solutions has been committed to serving wafer foundry in mainland China. In addition to providing customers with chemical filter products, Nanjing R&D center has set up a chemical laboratory to carry out inspection test for each stage from raw materials to completed products. Once the products are delivered to customer, samples are taken to verify the concentration after installation meets the application requirements, return visits and tests regularly.
Panel type ion exchange fiber chemical filter Puro-F
Panel type modified activated carbon chemical filter Puro-P
Box type activated carbon chemical filter Puro-C
Single flange V-type ion exchange fiber chemical filter Puro-V
Carbon cartridge chemical filter CT
Non flange ion exchange resin chemical filter Puro-V
MayAir and China’s semiconductor industry grow together
Job references
SMIC (Shanghai) 14nm process announced that the yield has reached the industry mass production level
Chongqing HKC 8.6 generation Ultra HD display device line announced the yield rate of 98.5%
Shanghai Microelectronics Lithography Equipment of cleanliness ISO Class 1
TCL G11 project won LEED platinum certification
MayAir is the first supplier that BOE chooses to replace foreign brands
HuaHong’s self-developed breakthrough 28 nanometers refer to 14 nanometer
Large-scale high-speed group control system
Monitoring > 100,000 FFU | Remote fault feedback < 8 seconds | Compatible with AC and DC fans | Compatible with multiple communication protocols | Automatic configuration technology | Wireless control technology | Optimized vector pulse width modulation low harmonic technology
CFD simulation
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Promote the development of purification industry and improve global air quality
